Hf-Based High-k Dielectrics
In this work, the reliability of HfO2 (hafnium oxide) with poly gate and dual metal gate electrode (Ru–Ta alloy, Ru) was investigated. Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. Dynamic stressing has also been used. It was found th...
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| Main Authors: | , |
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| Corporate Author: | |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Morgan & Claypool Publishers,
2006.
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| Edition: | 1st edition. |
| Subjects: | |
| Online Access: | Full text (Wentworth users only) |